HOT-ELECTRON NOISE AND DIFFUSION IN ALGAAS GAAS/

Citation
V. Aninkevicius et al., HOT-ELECTRON NOISE AND DIFFUSION IN ALGAAS GAAS/, Semiconductor science and technology, 9(5), 1994, pp. 576-579
Citations number
15
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
9
Issue
5
Year of publication
1994
Supplement
S
Pages
576 - 579
Database
ISI
SICI code
0268-1242(1994)9:5<576:HNADIA>2.0.ZU;2-9
Abstract
The electric field dependence of the microwave noise temperature and t he diffusion coefficient are found to be significantly different for t wo sets of AlGaAs/GaAs structures with different spacer thickness and aluminium mole fraction. In the samples with a 'wide' quantum well (QW ), one maximum of the diffusion coefficient is observed at fields belo w the threshold for the intervalley diffusion, but two maxima are char acteristic of a 'narrow' QW with an intersubband gap wider than the k( B)T0. A microscopic explanation of the observed noise spectra of AlGaA s//GaAs is given and used to determine kinetic parameters of the heter ostructures.