OPTICAL CHARACTERIZATION OF TEXTURED MICROWAVE CVD DIAMOND

Citation
S. Haq et al., OPTICAL CHARACTERIZATION OF TEXTURED MICROWAVE CVD DIAMOND, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 593-597
Citations number
4
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
4-6
Year of publication
1994
Pages
593 - 597
Database
ISI
SICI code
0925-9635(1994)3:4-6<593:OCOTMC>2.0.ZU;2-I
Abstract
Diamond which exhibits strong preferred orientation in [111], [110] an d [100] directions was grown in thicknesses of up to 200 mum by microw ave chemical vapour deposition in an Astex reactor. Characterization b y X-ray diffraction, scanning electron microscopy, Raman spectroscopy and IR transmission on both free-standing diamond and diamond on silic on substrates was performed. It was found that there is a variation in optical transmission with both the preferred orientation of the diamo nd and the layer thickness. The lowest CH absorptions were obtained fo r the [110] material followed by the [100] and then the [111] diamond. The defect-induced single-phonon absorption was highest in the [111] textured material but no significant absorption difference between the [100] and [110] textures was found. By the addition of suitable amoun ts of oxygen, both the CH-related and the single-phonon absorption cou ld be reduced to undetectable levels. A decrease in CH absorption with layer thickness may be related to the poorer quality and microstructu re of the diamond close to the growth interface.