KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS

Citation
C. Germain et al., KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 598-601
Citations number
9
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
4-6
Year of publication
1994
Pages
598 - 601
Database
ISI
SICI code
0925-9635(1994)3:4-6<598:KLPOAG>2.0.ZU;2-4
Abstract
The plasma plume created above a graphite target irradiated by a KrF l aser beam (248 nm) has been investigated using three experimental meth ods: ion detection, time and spatially resolved emission spectroscopy and double Langmuir probe. Measurements give information on the energe tic distribution of ionic species, on the kinetic temperature of the g as and on the electronic density of the plasma plume. Carbon thin film s have been deposited on silicon substrates: for high fluence values ( above 1000 J cm-2) and low temperature (30-degrees-C), the films are h arder than c-BN, their refractive index is 2.4, and XPS analysis gives spectra with a high sp3 configuration.