C. Germain et al., KRF LASER PHOTOABLATION OF A GRAPHITE TARGET - APPLICATION TO THE DEVELOPMENT OF THIN-FILMS, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 598-601
The plasma plume created above a graphite target irradiated by a KrF l
aser beam (248 nm) has been investigated using three experimental meth
ods: ion detection, time and spatially resolved emission spectroscopy
and double Langmuir probe. Measurements give information on the energe
tic distribution of ionic species, on the kinetic temperature of the g
as and on the electronic density of the plasma plume. Carbon thin film
s have been deposited on silicon substrates: for high fluence values (
above 1000 J cm-2) and low temperature (30-degrees-C), the films are h
arder than c-BN, their refractive index is 2.4, and XPS analysis gives
spectra with a high sp3 configuration.