A variety of diamond films with varying thicknesses from 40 to 1200 nm
have been prepared by microwave plasma chemical vapour deposition (CV
D). Their wear performance has been investigated as a function of morp
hology and layer thickness along with their surface roughness and Rama
n features. Accelerated wear testing was performed with a modified sph
ere-on-tape test using lapping tapes of differing abrasiveness. The we
ar data of the thin film deposits are compared with data obtained for
bulk WC, AlN, Si, Al2O3 and other materials. The CVD diamond films are
shown to be much more wear resistant than other well-established low
wear materials, almost independent of morphology and layer thickness.
Layers with an RMS roughness above 20 nm are shown to damage the abrad
ing tapes severely. Ultralow wear, smooth CVD diamond coatings, down t
o thicknesses of 40 nm, are shown to be feasible.