MICROSTRUCTURE OF TITANIUM NITRIDE THIN-FILMS CONTROLLED BY ION-BOMBARDMENT IN A MAGNETRON-SPUTTERING DEVICE

The structure of titanium nitride thin films deposited by unbalanced m agnetron sputtering on high chromium steel substrates was studied by X -ray diffraction. In order to characterize relations between the micro structure of sputtered TiN films and the deposition conditions, the pa rameter E(p) was introduced as the average energy transmitted from bom barding particles (ions, electrons, neutrals, photons) to one condensi ng particle of the film. A transition from a porous to a compact micro structure was found with increasing E(p). The possible inhomogeneity o f titanium nitride films is discussed.