SURFACE-CHEMISTRY OF THIOLS ON COPPER - AN EFFICIENT WAY OF PRODUCINGMULTILAYERS

Citation
H. Keller et al., SURFACE-CHEMISTRY OF THIOLS ON COPPER - AN EFFICIENT WAY OF PRODUCINGMULTILAYERS, Thin solid films, 244(1-2), 1994, pp. 799-805
Citations number
22
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
244
Issue
1-2
Year of publication
1994
Pages
799 - 805
Database
ISI
SICI code
0040-6090(1994)244:1-2<799:SOTOC->2.0.ZU;2-M
Abstract
Investigations on the surface chemistry of the self-assembly process ( chemisorption) of thiols on copper are reported. The chemisorption was investigatd on copper sheets and on copper powder. Copper exposed to air is covered with a thin oxide layer. On contact with thiols the oxi dic copper species are transformed to copper thiolates by a redox ract ion. Cu2+ is reduced to Cu+ and thiol (HSR) is oxidized to disulphide (RS-SR). Excess thiol forms copper thiolate complexes which build up s elf-assembled multilayers with layer thicknesses of 20-90 nm. The self -assembled thiolate layers cause a strong hydrophobization of the copp er surface.