X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF SUBSTRATE SURFACE PRETREATMENTS FOR DIAMOND NUCLEATION

Citation
F. Arezzo et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF SUBSTRATE SURFACE PRETREATMENTS FOR DIAMOND NUCLEATION, Journal of applied physics, 75(10), 1994, pp. 5375-5381
Citations number
29
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
10
Year of publication
1994
Part
1
Pages
5375 - 5381
Database
ISI
SICI code
0021-8979(1994)75:10<5375:XPSOSS>2.0.ZU;2-#
Abstract
The effects of surface pretreatments on the nucleation of diamond on s ilicon substrates have been studied by quantitative x-ray photoelectro n spectroscopy measurements. lt was found that methods of surface pret reatments including ultrasonic abrasion, scratching, and dc biasing al l introduced a substantial amount of carbon species to the substrate s urface which was the primary reason for the enhancement of diamond nuc leation. Both the scratching and biasing processes formed carbide on t he Si surface which also facilitated diamond nucleation. In addition, the biasing process reduced and suppressed the formation of oxide whic h further contributed to the enhanced nucleation density of diamond. T his analysis is consistent with the experimental data of nucleation de nsities of diamond on the differently pretreated substrate surfaces bo th observed in this study and found in the literature.