F. Arezzo et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF SUBSTRATE SURFACE PRETREATMENTS FOR DIAMOND NUCLEATION, Journal of applied physics, 75(10), 1994, pp. 5375-5381
The effects of surface pretreatments on the nucleation of diamond on s
ilicon substrates have been studied by quantitative x-ray photoelectro
n spectroscopy measurements. lt was found that methods of surface pret
reatments including ultrasonic abrasion, scratching, and dc biasing al
l introduced a substantial amount of carbon species to the substrate s
urface which was the primary reason for the enhancement of diamond nuc
leation. Both the scratching and biasing processes formed carbide on t
he Si surface which also facilitated diamond nucleation. In addition,
the biasing process reduced and suppressed the formation of oxide whic
h further contributed to the enhanced nucleation density of diamond. T
his analysis is consistent with the experimental data of nucleation de
nsities of diamond on the differently pretreated substrate surfaces bo
th observed in this study and found in the literature.