The structure of thin films of molybdenum sulphide (MoS2) deposited on
silicon substrates has been investigated as a function of temperature
using X-rav diffraction and transmission electron microscopy. The ini
tial state of the films is characterised by microcrystals with a diame
ter of around 2 nanometres. Thermal treatment leads to an increase in
grain size to around 20 nm at 900-degrees-C. A continuous reduction in
the c lattice parameter is observed during heating. Prior to heat tre
atment the structure of the film is dependent upon film thickness. Upo
n heating these differences are observed to disappear. Isothermal meas
urements of the diffraction pattern at elevated temperatures show only
slight changes in the structure with time. The final state of the MoS
2 is similar to that of bulk polcrystalline molybdenum sulphide.