QUANTIFICATION OF SIMS DEPTH PROFILES OF ODS-SUPERALLOYS BY USING CLUSTER ION FORMATION FROM REACTIVE PRIMARY IONS

Cluster ion formation, with both oxygen and caesium as reactive elemen ts, (MO- and MCs+ ions) has been studied using secondary ion mass spec trometry. A comparison of various primary ion beam conditions is given . The investigations were carried out on aluminium oxide films and req uired a special charge compensation method. An improvement in the quan tification concentration by use of cluster ions can only be expected f rom MCs+ measurements; however the total ionization probabilities stil l depend on matrix composition.