ELECTRON-PROBE MICROANALYSIS OF CHEMICAL GRADIENTS IN GAS-PRESSURE SINTERED SILICON-NITRIDE

Citation
E. Bischoff et al., ELECTRON-PROBE MICROANALYSIS OF CHEMICAL GRADIENTS IN GAS-PRESSURE SINTERED SILICON-NITRIDE, Fresenius' journal of analytical chemistry, 349(1-3), 1994, pp. 242-243
Citations number
3
Categorie Soggetti
Chemistry Analytical
ISSN journal
09370633
Volume
349
Issue
1-3
Year of publication
1994
Pages
242 - 243
Database
ISI
SICI code
0937-0633(1994)349:1-3<242:EMOCGI>2.0.ZU;2-E
Abstract
During gas pressure sintering of silicon nitride (Si3N4) - which norma lly contains oxide additives such as SiO2, Al2O3 and Y2O3 - in a resis tance heated graphite furnace, a reduction of the Si3N4, sample takes place. At high temperatures (> 1800-degrees-C) this effect is accompan ied by decomposition reactions of Si3N4. Both lead to chemical gradien ts in larger components which influence the strength of the sintered a rticle. Electron probe microanalysis (EPMA) has been carried out in or der to study the influence of the crucible material [graphite (C), bor on nitride (BN)] and the quantity of filling on the gradient formation .