A NEW METHOD OF DIAMOND CVD WITH A CLOSED GAS CIRCUIT

Authors
FRYDA M SIX R POCKELMANN R KLAGES CP
Citation
M. Fryda et al., A NEW METHOD OF DIAMOND CVD WITH A CLOSED GAS CIRCUIT, DIAMOND AND RELATED MATERIALS, 3(7), 1994, pp. 1040-1044
Citations number
4
Categorie Soggetti
Material Science
Journal title
DIAMOND AND RELATED MATERIALS → ACNP
ISSN journal
09259635
Volume
3
Issue
7
Year of publication
1994
Pages
1040 - 1044
Database
ISI
SICI code
0925-9635(1994)3:7<1040:ANMODC>2.0.ZU;2-O
Abstract
A new closed gas circuit method for diamond chemical vapour deposition (CVD) has been investigated. On the basis of thermodynamic and kineti c considerations a carbon reactor has been designed which is able to r emove undesired products of the CVD process and to replenish the neces sary gaseous components, particularly methane and carbon monoxide. The limits of this gas regeneration method with respect to flow rates, pr essure and temperature are reported and discussed.