S. Dhara et al., PARAMETRIC INVESTIGATION FOR DIRECT CHEMICAL-VAPOR-DEPOSITION OF MAGNETITE FILMS, Journal of magnetism and magnetic materials, 134(1), 1994, pp. 29-33
A direct growth of magnetite (Fe3O4) phase has been obtained by a low-
pressure chemical vapour deposition (LPCVD) technique using metal-orga
nic ferric dipivaloylmethanate (Fe(DPM)3) as precursor. On oxidation t
hese films are converted to gamma-Fe2O3 phase which give superior magn
etic coercivity values. Crystallographic structures are determined by
small-angle XRD analysis. As-deposited magnetite and oxidized gamma-Fe
2O3 films are reported with coercivity values of 93 and 122 kA/m, resp
ectively. Squareness ratios of 0.80 are observed for both as-deposited
Fe3O4 and oxidized gamma-Fe2O3 films with remanent magnetization valu
es of 101 and 102 mT, respectively. Deposition conditions of the as-de
posited films along with a growth mechanism involving a gas phase reac
tion, as promoted by a hot wall type reactor chamber, are described.