PARAMETRIC INVESTIGATION FOR DIRECT CHEMICAL-VAPOR-DEPOSITION OF MAGNETITE FILMS

Citation
S. Dhara et al., PARAMETRIC INVESTIGATION FOR DIRECT CHEMICAL-VAPOR-DEPOSITION OF MAGNETITE FILMS, Journal of magnetism and magnetic materials, 134(1), 1994, pp. 29-33
Citations number
9
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
03048853
Volume
134
Issue
1
Year of publication
1994
Pages
29 - 33
Database
ISI
SICI code
0304-8853(1994)134:1<29:PIFDCO>2.0.ZU;2-L
Abstract
A direct growth of magnetite (Fe3O4) phase has been obtained by a low- pressure chemical vapour deposition (LPCVD) technique using metal-orga nic ferric dipivaloylmethanate (Fe(DPM)3) as precursor. On oxidation t hese films are converted to gamma-Fe2O3 phase which give superior magn etic coercivity values. Crystallographic structures are determined by small-angle XRD analysis. As-deposited magnetite and oxidized gamma-Fe 2O3 films are reported with coercivity values of 93 and 122 kA/m, resp ectively. Squareness ratios of 0.80 are observed for both as-deposited Fe3O4 and oxidized gamma-Fe2O3 films with remanent magnetization valu es of 101 and 102 mT, respectively. Deposition conditions of the as-de posited films along with a growth mechanism involving a gas phase reac tion, as promoted by a hot wall type reactor chamber, are described.