WIDE BANDWIDTH (100)GAAS FLUORIDES QUARTER-WAVELENGTH BRAGG REFLECTORS GROWN BY MOLECULAR-BEAM EPITAXY/

Citation
Z. Shi et al., WIDE BANDWIDTH (100)GAAS FLUORIDES QUARTER-WAVELENGTH BRAGG REFLECTORS GROWN BY MOLECULAR-BEAM EPITAXY/, Applied physics letters, 69(23), 1996, pp. 3474-3476
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
69
Issue
23
Year of publication
1996
Pages
3474 - 3476
Database
ISI
SICI code
0003-6951(1996)69:23<3474:WB(FQB>2.0.ZU;2-8
Abstract
Broadband quarter-wavelength Bragg reflectors that consist of periodic stacks of fluorides (CaF2-BaF2-CaF2) and GaAs, centered at 1.4 mu m, were grown by molecular beam epitaxy. Despite a total fluoride thickne ss as high as 720 nm, crack-free surface morphology was obtained. In t his letter, we report a crack-free standard quarter-wavelength III-V s emiconductor-fluoride Bragg reflector. With only three stacks, the ban dwidth with reflectance above 95% is about 650 nm (1.15-1.80 mu m), wh ile, near the center wavelength, the reflectivity is as high as 99%. B oth important wavelengths of 1.3 and 1.55 mu for optical communication are included in the very wide high reflectance plateau. These mirrors are expected to have wide applications for optical and optoelectronic devices. (C) 1996 American Institute of Physics.