TRACE-ANALYTICAL METHODS FOR MONITORING CONTAMINATIONS IN SEMICONDUCTOR-GRADE SI MANUFACTURING

Generating systematic data on incoming materials, processes, productio n environments and products by contamination monitoring and analyis is the key element of quality assurance in semiconductor fabrication. To be able to match the analytical capabilities to the requirements of i mproving materials and processes, the level of sophistication of conta mination monitoring and analysis systems must be higher than the expec ted demands in the fabrication line. The accuracy of each analytical m ethod has to be cross-checked by different independent techniques. Acc uracy, precision, power of detection, analysis time and expenses shoul d always be tailored to the particular case. All monitoring methods mu st run under statistical process control. The methods described meet t he analytical requirements of the near future in semiconductor grade s ilicon manufacturing.