L. Fabry et al., TRACE-ANALYTICAL METHODS FOR MONITORING CONTAMINATIONS IN SEMICONDUCTOR-GRADE SI MANUFACTURING, Fresenius' journal of analytical chemistry, 349(4), 1994, pp. 260-271
Generating systematic data on incoming materials, processes, productio
n environments and products by contamination monitoring and analyis is
the key element of quality assurance in semiconductor fabrication. To
be able to match the analytical capabilities to the requirements of i
mproving materials and processes, the level of sophistication of conta
mination monitoring and analysis systems must be higher than the expec
ted demands in the fabrication line. The accuracy of each analytical m
ethod has to be cross-checked by different independent techniques. Acc
uracy, precision, power of detection, analysis time and expenses shoul
d always be tailored to the particular case. All monitoring methods mu
st run under statistical process control. The methods described meet t
he analytical requirements of the near future in semiconductor grade s
ilicon manufacturing.