STUDY OF INTERDIFFUSION IN PD CU MULTILAYERED FILMS BY AUGER DEPTH PROFILING/

Citation
Ij. Jeon et al., STUDY OF INTERDIFFUSION IN PD CU MULTILAYERED FILMS BY AUGER DEPTH PROFILING/, Journal of applied physics, 75(12), 1994, pp. 7825-7828
Citations number
14
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
12
Year of publication
1994
Pages
7825 - 7828
Database
ISI
SICI code
0021-8979(1994)75:12<7825:SOIIPC>2.0.ZU;2-A
Abstract
In thin films, diffusion phenomena play an important role for the grow th process, and in the understanding of the mechanical, electrical and magnetic properties. The change in the concentration profile due to t he interdiffusion by annealing was investigated using Auger electron s pectroscopy depth-profiling technique on Pd/Cu multilayered films. It was observed that the initial concentration distributions, which were almost rectangular in the unheated samples, were changed into sinusoid al ones in the annealed films at various temperatures. The concentrati on-independent interdiffusion coefficients were calculated from the am plitudes of sinusoidal distributions. The activation energy was determ ined to be 1.66+/-0.23 eV from the Arrhenius plot. The concentration-d ependent interdiffusivity at 150-degrees-C was also estimated using Bo ltzmann-Matano method.