UV LASER MODIFICATIONS AND ETCHING OF POLYMER-FILMS (PMMA) BELOW THE ABLATION THRESHOLD

Authors
BITYURIN N MURAVIOV S ALEXANDROV A MALYSHEV A
Citation
N. Bityurin et al., UV LASER MODIFICATIONS AND ETCHING OF POLYMER-FILMS (PMMA) BELOW THE ABLATION THRESHOLD, Applied surface science, 110, 1997, pp. 270-274
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
110
Year of publication
1997
Pages
270 - 274
Database
ISI
SICI code
0169-4332(1997)110:<270:ULMAEO>2.0.ZU;2-I
Abstract
The modification of thin polymethylmethacrylate (PMMA) films by the fi fth harmonic (lambda = 216 nm) of a Nd:YAP laser is studied. This modi fication manifests itself in essential changes of optical properties, film thickness (bulk etching) and solubility in appropriate developers (crosslinking). The modification kinetics is investigated for films o f different thickness, for different laser fluences (below ablation th reshold), in air, and in vacuum. The nonreciprocal response not connec ted with laser heating has been obtained.