DEPOSITION OF BATIO3 THIN-FILMS BY A HYBRID DC-FIELD ENHANCED PLD-PROCESS

Citation
A. Husmann et al., DEPOSITION OF BATIO3 THIN-FILMS BY A HYBRID DC-FIELD ENHANCED PLD-PROCESS, Applied surface science, 110, 1997, pp. 293-298
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
110
Year of publication
1997
Pages
293 - 298
Database
ISI
SICI code
0169-4332(1997)110:<293:DOBTBA>2.0.ZU;2-G
Abstract
BaTiO3 thin films are deposited onto (111)-Si/Ti/Pt using a hybrid DC- field enhanced pulsed laser deposition (PLD)-technique with excimer la ser radiation. Space- and time-resolved plasma emission spectroscopy ( PES) is used for determination of the mean velocity of the particle sp ecies within the plasma/vapour. The structural properties of the films are characterised by XRD-measurements and micro-Raman spectroscopy. T he electrical properties are analysed by impedance measurements. The e lectric field influences the number of excited and ionised particles w ithin the ambient gas and plasma, caused by a discharge in the ambient gas and interaction between ambient gas and plasma. The hybrid proces s allows production of crystalline films of the tetragonal phase at re duced deposition temperatures. Dielectric constants of up to epsilon(r )=320 are obtained.