EPITAXIAL-GROWTH OF CEO2 ON MGO BY PULSED-LASER DEPOSITION

Citation
Rp. Casero et al., EPITAXIAL-GROWTH OF CEO2 ON MGO BY PULSED-LASER DEPOSITION, Applied surface science, 110, 1997, pp. 341-344
Citations number
9
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
110
Year of publication
1997
Pages
341 - 344
Database
ISI
SICI code
0169-4332(1997)110:<341:EOCOMB>2.0.ZU;2-V
Abstract
CeO2 thin films have been deposited on single-crystal MgO(001) substra tes by the pulsed laser ablation technique. The composition, phase for mation, crystalline quality of the films, and the film/substrate orien tation relationships have been analyzed by the complementary use of Ru therford backscattering spectrometry and X-ray diffraction analysis. T he films grown under vacuum at temperatures lower than 700 degrees C a re not crystalline. The quality of the films is largely improved at hi gher temperatures. So, highly textured (001) CeO2 films are grown at 7 50 degrees C under vacuum with a crystallinity comparable to that of m onocrystals. The film/substrate epitaxial relationships present well d efined in-plane orientations at 0 degrees and at 45 degrees. The relat ive amount of film grown in each one of these orientations is largely determined by the growth conditions.