CNX THIN-FILMS OBTAINED BY LASER-INDUCED CVD IN DIFFERENT GAS-SUBSTRATE SYSTEMS

Authors
ALEXANDRESCU R CIREASA R PUGNA G CRUNTEANU A PETCU S MORJAN I MIHAILESCU IN ANDREI A
Citation
R. Alexandrescu et al., CNX THIN-FILMS OBTAINED BY LASER-INDUCED CVD IN DIFFERENT GAS-SUBSTRATE SYSTEMS, Applied surface science, 110, 1997, pp. 544-548
Citations number
16
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
110
Year of publication
1997
Pages
544 - 548
Database
ISI
SICI code
0169-4332(1997)110:<544:CTOBLC>2.0.ZU;2-1
Abstract
The possibility to deposit CNx thin films by laser-induced CVD techniq ue was investigated. For this purpose, different carbon/nitrogen conta ining mixtures and substrates were used. CO2 and the KrF laser irradia tions were employed. The deposition was alternatively performed on las er pre-deposited catalytic titanium thin films and on bare substrates (quartz and alumina). An XPS analysis of CNx film composition reveals that in the presence of Ti layers nitrogen incorporation is enhanced a nd chemical structures with higher transfer states are favored.