LASER-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF HYDROGEN-CONTAINING AMORPHOUS-CARBON AT ROOM-TEMPERATURE

Hydrogen containing amorphous carbon films were deposited by photolyti c decomposition of methylene iodide, CH2I2, at room temperature. An ex cimer laser operated at 193 nm was used as the excitation source. Smoo th and adherent films were produced on Si(100) substrates. The influen ce of the CH2I2 partial pressure and the laser beam to substrate dista nce on the growth process was investigated. The films were characteriz ed by Raman spectroscopy, atomic force microscopy, energy dispersive X -ray spectroscopy. and X-ray photoelectron spectroscopy. The iodine an d oxygen contents in the carbon films were less than 1% and the hydrog en content was approximately 50%.