CORRELATION BETWEEN PLASMA DYNAMICS AND THIN-FILM PROPERTIES IN PULSED-LASER DEPOSITION

The pressure-distance scaling law for pulsed laser deposition is exami ned for several thin film systems. This scaling law is due to the plas ma dynamics occurring within the laser plasma plume near the location of the substrate. Time-of-flight studies of both ions and neutrals con firm the existence of an optimal velocity distribution for optimal fil m deposition. Fast ions play a major role in determining the quality o f the films deposited. They may provide surface activation of the film or induce damage to the film depending on their kinetic energies.