PLASMA PHASE OXIDATION DURING PREPARATION OF OXIDE SUPERCONDUCTING AND FERROELECTRIC THIN-FILMS USING PULSED-LASER DEPOSITION

Citation
Y. Yamagata et al., PLASMA PHASE OXIDATION DURING PREPARATION OF OXIDE SUPERCONDUCTING AND FERROELECTRIC THIN-FILMS USING PULSED-LASER DEPOSITION, Applied surface science, 110, 1997, pp. 611-615
Citations number
10
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
ISSN journal
01694332
Volume
110
Year of publication
1997
Pages
611 - 615
Database
ISI
SICI code
0169-4332(1997)110:<611:PPODPO>2.0.ZU;2-2
Abstract
Plasma phase oxidation was investigated during preparation of Y-Ba-Cu- O (YBCO) superconducting and Pb-Zr-Ti-O (PZT) ferroelectric thin films using KrF pulsed laser deposition. The YBCO and PZT plasma plumes wer e produced at a laser fluence of 0.1 to 6 J/cm(2), a mixture ambient o f oxygen and argon and a pressure range of 10(-6)-1 Torr. In the YBCO ablation, YO and BaO molecules are formed in the ablation plasma with different reactivities, while most of the CuO molecules are ejected fr om the target. In the PZT film preparation, TiO molecules are generate d in the plasma phase. Plasma phase oxidation affects strongly the cha racteristics of oxide superconducting and ferroelectric thin films.