FAR-UV REFLECTANCE OF UHV-PREPARED AL FILMS AND ITS DEGRADATION AFTEREXPOSURE TO O-2

Authors
LARRUQUERT JI MENDEZ JA AZNAREZ JA
Citation
Ji. Larruquert et al., FAR-UV REFLECTANCE OF UHV-PREPARED AL FILMS AND ITS DEGRADATION AFTEREXPOSURE TO O-2, Applied optics, 33(16), 1994, pp. 3518-3522
Citations number
11
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
33
Issue
16
Year of publication
1994
Pages
3518 - 3522
Database
ISI
SICI code
0003-6935(1994)33:16<3518:FROUAF>2.0.ZU;2-D
Abstract
The far-ultraviolet reflectance of aluminum films prepared and maintai ned under ultrahigh-vacuum conditions was measured for wavelengths ran ging from 82.6 to 120.0 nm. The degradation of the reflectance after e xposure to controlled doses of molecular oxygen was also studied. The degradation rate proved to be higher for wavelengths less than 120 nm than previous measurements made at 121.6 nm.