K. Tsuji et al., BOUND-BOUND A 2-SIGMA-X 2-PI TRANSITION OF NO-AR VAN-DER-WAALS COMPLEXES(), The Journal of chemical physics, 100(8), 1994, pp. 5441-5447
The bound-bound excitation spectrum of the NO-Ar van der Waals complex
associated with the NO A 2SIGMA+ -X 2PI transition has been measured
by the resonance enhanced two-photon ionization (RE2PI) method using a
time-of-flight (TOF) mass spectrometer. The van der Waals bands chara
cterized by red-shaded rotational contours present no regularity in th
e progression. The photodissociation action spectra obtained by probin
g the NO A 2SIGMA+(upsilon' = 0, N' = 1 - 8) products have also been m
easured, and the binding energies (D0) of the complex in the A 2SIGMA and X 2PI states are determined as 44 and 88 cm-1, respectively. The
action spectrum corresponding to the NO A 2SIGMA+ (upsilon' = 0, N' =
1 and 2) product shows several shape resonance peaks, which implies th
at the intermolecular potential between NO A 2SIGMA+ and Ar has a pote
ntial barrier of about 24 cm-1.