VACUUM PROCESSING ISSUES IN SPUTTERING AND PECVD

Authors
STRASSER G SCHMITT JPM BADER ME
Citation
G. Strasser et al., VACUUM PROCESSING ISSUES IN SPUTTERING AND PECVD, Solid state technology, 37(6), 1994, pp. 83
Citations number
4
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
Solid state technology → ACNP
ISSN journal
0038111X
Volume
37
Issue
6
Year of publication
1994
Database
ISI
SICI code
0038-111X(1994)37:6<83:VPIISA>2.0.ZU;2-1
Abstract
Vacuum-based thin-film processes play an important role in the product ion of electronic devices, optical components, and microelectromechani cal systems. This article discusses current vacuum processing challeng es in sputtering, a physical vapor deposition (PVD) process, and plasm a enhanced CVD (PECVD).