SIMULATION OF REACTIVE SPUTTERING FROM A CONCENTRIC DUAL-SOURCE MAGNETRON IN ROLL-TO-ROLL COATING PROCESSES

The performance of a magnetron system with two, electrically isolated concentric targets, which may be used for the deposition of reactively sputtered alloy metal oxide films has been simulated at relatively lo w pressures, using a steady state model which takes the specific syste m geometry into consideration. The proposed model not only allows for the calculation of the radial thickness and composition distributions of the growing film, but it also enables the investigation of the beha viour of the system when several process parameters are varied, making easier the optimization of its geometrical configuration, i.e. the se lection of the inter-ring distances as well as the target-to-substrate separation. The simulation results for roll-to-roll coating using an indium-tin system, are in good agreement with experimental results rep orted by other investigators.