MICRODISTORTION MEASUREMENT IN AU TEXTURE D THIN-FILMS BY X-RAY-DIFFRACTION

Authors
DURAND N BIMBAULT L BADAWI KF GOUDEAU P
Citation
N. Durand et al., MICRODISTORTION MEASUREMENT IN AU TEXTURE D THIN-FILMS BY X-RAY-DIFFRACTION, Journal de physique. III, 4(6), 1994, pp. 1025-1032
Citations number
13
Categorie Soggetti
Material Science","Phsycs, Fluid & Plasmas","Physics, Applied
Journal title
Journal de physique. III → ACNP
ISSN journal
11554320
Volume
4
Issue
6
Year of publication
1994
Pages
1025 - 1032
Database
ISI
SICI code
1155-4320(1994)4:6<1025:MMIATD>2.0.ZU;2-F
Abstract
Microdistorsion analysis in Au 150 nm thin films is presented in this study. Applying the method of the << integral width >>, known and empl oyed in bulk materials, we have shown its feasibility and its interest in the case of thin films. Furthermore, in relation with X-Ray diffra ction stress measurement. we found important effects of the deposition conditions on the films microstructure.