TRANSIENT PROCESSES DURING PORE FORMATION IN N-TYPE SILICON

Citation
Al. Vinke et al., TRANSIENT PROCESSES DURING PORE FORMATION IN N-TYPE SILICON, Russian electrochemistry, 29(8), 1993, pp. 1172-1176
Citations number
23
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
10703276
Volume
29
Issue
8
Year of publication
1993
Pages
1172 - 1176
Database
ISI
SICI code
1070-3276(1993)29:8<1172:TPDPFI>2.0.ZU;2-T
Abstract
Nonequilibrium processes occurring in an electrolyte-semiconductor sys tem (hydrofluoric acid-n-type silicon) were studied during anodization in the mode of pore formation. The transition from transient modes of anodization with strongly nonlinear current-voltage characteristics t o steady-state conditions was studied. The current-voltage curves obta ined experimentally for the electrolyte-semiconductor (silicon) system is S-shaped. Processes of self-organization developing at the silicon ' surface in the above system under the action of ultrasound were dete cted and experimentally investigated. The major aspects of these proce sses are concordant with those of the formation of three-dimensionally periodic structures at surfaces stimulated by laser light that had be en studied previously.