OXIDE-FILMS AND ELECTROCAPILLARY BEHAVIOR OF OXIDIZED COPPER IN KOH SOLUTIONS

The amounts of Cu2O, CuO, and Cu(OH)2 present on copper in KOH solutio ns were determined and their accumulation studied as a function of tim e over a wide range of potentials. The growth of Cu2O and CuO is atten ded by an increase in electron work function, which leads to a redistr ibution of the overall potential drop between the liquid phase and the electric double layer located in the oxide layer. The complex relatio n between the work of surface formation and the potential was explaine d and the potential of zero charge of the oxidized copper was determin ed.