An automatic, accurate mask alignment method, based on a modified moir
e technique suitable for x-ray lithography is presented. In this techn
ique, the alignment marks are in the form of gratings. The high slope
region of the moire signal is used to obtain higher sensitivity and be
tter position control accuracy. Automatic alignment is achieved by usi
ng the difference of the moire signal and its inverted signal obtained
by computer. This difference signal is zero at a point in the higher
slope region that is considered the correct alignment point. This diff
erence signal is treated as an error signal, which is used for obtaini
ng control signal by performing the proportional, integration and diff
erential (PID) algorithm. The 12-bit analog-to-digital (A/D) and digit
al-to-analog (D/A) convertors are used to interface the piezoelectric-
transducer-(PZT)-driven alignment system with the computer. Under the
present experimental conditions, accuracy for alignment is of the orde
r of +/-0.06 mum.