Recent studies, simulating the behavior of insulating materials in a f
usion device environment, show that under concurrent applications of r
adiation, applied electric field, and elevated temperature, they suffe
r degradation of their electrical properties. The goal of the present
study is to address the mechanism of this radiation-induced electrical
degradation and the defects involved. Our results show that when an A
l2O3 crystal under a moderate electric field is irradiated with 1.8 Me
V electrons at 773 K, the dc conductivity during and after irradiation
increases rapidly above a critical dose and saturates after the condu
ctivity increases by a factor of 10(3). There are two main conclusions
. First, the electrical degradation is due to the charge of the electr
ons and holes created during radiation, rather than due to displacemen
ts of indigenous ions by elastic collisions with the energetic electro
ns. Second, the defects attending the observed electrical degradation
are dislocations. Transmission electron microscopy studies revealed re
gions of large dislocation density distributed nonuniformly throughout
the degraded area, with an overall average density of approximately 1
0(9) cm-2, as opposed to approximately 10(4) cm-2 in regions which wer
e not electron irradiated nor subjected to an electric field. The conc
entration of point defects, as characterized by optical absorption and
electron paramagnetic resonance, was below detectable limit. In addit
ion, no second phase was observed.