STUDY AND ANALYSIS OF SUBMICRON-PERIOD GRATING FORMATION ON POLYMERS ABLATED USING A KRF LASER-IRRADIATED PHASE MASK

Authors
DYER PE FARLEY RJ GIEDL R RAGDALE C REID D
Citation
Pe. Dyer et al., STUDY AND ANALYSIS OF SUBMICRON-PERIOD GRATING FORMATION ON POLYMERS ABLATED USING A KRF LASER-IRRADIATED PHASE MASK, Applied physics letters, 64(25), 1994, pp. 3389-3391
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
64
Issue
25
Year of publication
1994
Pages
3389 - 3391
Database
ISI
SICI code
0003-6951(1994)64:25<3389:SAAOSG>2.0.ZU;2-W
Abstract
Submicron-period gratings have been formed in polyethylene terephthala te and polyimide films using a KrF laser irradiated, zero suppressed, phase mask with a period d = 533 nm. The imprinted grating has a domin ant period of d rather than d/2, a result which is shown to be due to recording the pattern by a threshold surface ablation process.