Wl. Warren et al., LINKS BETWEEN OXIDE, INTERFACE, AND BORDER TRAPS IN HIGH-TEMPERATURE ANNEALED SI SIO2 SYSTEMS, Applied physics letters, 64(25), 1994, pp. 3452-3454
Evidence is provided to show that enhanced hole-, interface-, and bord
er-trap generation in irradiated high-temperature annealed Si/SiO2/Si
systems are all related either directly, or indirectly, to the presenc
e of oxygen vacancies. We find that the calculated oxygen vacancy due
to high-temperature anneals from 800 to 950-degrees-C in metal-oxide-s
emiconductor capacitors closely matches the radiation-induced oxide-tr
apped charge. This strongly suggests that oxygen vacancies (or vacancy
-related complexes) are the dominant hole trapping sites in this parti
cular case. Along with the increase in radiation-induced oxide-trap ch
arge, we observe a concomitant increase in the interface- and border-t
rap densities. This suggests that in devices that receive high-tempera
ture anneals, all these phenomena are linked to the existence of oxyge
n vacancies either directly, or indirectly, perhaps via hole trapping
at these vacancies.