SOME PROPERTIES OF CARBON-FILMS DEPOSITED BY LASER-ABLATION

Citation
M. Jelinek et al., SOME PROPERTIES OF CARBON-FILMS DEPOSITED BY LASER-ABLATION, DIAMOND AND RELATED MATERIALS, 3(8), 1994, pp. 1128-1131
Citations number
5
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
8
Year of publication
1994
Pages
1128 - 1131
Database
ISI
SICI code
0925-9635(1994)3:8<1128:SPOCDB>2.0.ZU;2-V
Abstract
Hard carbon films were prepared by KrF excimer laser ablation from gra phite and glassy carbon targets for different power densities (1 x 10( 8)-3.5 x 10(9) W cm-2), Substrate temperatures T(s) (from room tempera ture to 300-degrees-C) and deposition rates. Optical and electrical pr operties, Raman spectra, microhardness and morphology of the layers an d time-of-flight (TOF) and resonant ionization spectroscopy of particl es ablated from targets were studied. The best film properties were ob tained for high densities and low T(s). In TOF spectra the ions of C+, C2+, C++ and C3+ were identified.