APPLICATION OF POROUS SILICON AS A SACRIFICIAL LAYER

Authors
LANG W STEINER P RICHTER A MARUSCZYK K WEIMANN G SANDMAIER H
Citation
W. Lang et al., APPLICATION OF POROUS SILICON AS A SACRIFICIAL LAYER, Sensors and actuators. A, Physical, 43(1-3), 1994, pp. 239-242
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Instument & Instrumentation
Journal title
Sensors and actuators. A, Physical → ACNP
ISSN journal
09244247
Volume
43
Issue
1-3
Year of publication
1994
Pages
239 - 242
Database
ISI
SICI code
0924-4247(1994)43:1-3<239:AOPSAA>2.0.ZU;2-8
Abstract
Using porous silicon as a sacrificial layer a surface micromachining ( SMM) process with a large distance from the structure to the substrate is realized. The application of this process for making free standing structures of polysilicon and flow channels is described.