M. Okawa et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF ADSORPTION AND PHOTODISSOCIATION OF DIMETHYLALUMINUM HYDRIDE, Applied surface science, 80, 1994, pp. 444-448
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Adsorption of dimethylaluminum hydride on silicon oxide was detected b
y the appearance of Al and C signals in X-ray photoelectron spectrosco
py (XPS) spectra at room temperature and at 200-degrees-C. In addition
, the effect of UV irradiation by a deuterium lamp was studied. A chan
ge of the C/Al atomic ratio was found. A marked time dependence of the
XPS signals was observed for adsorbates, which was attributed to deco
mposition induced by the irradiation of the Al Kalpha line (1487 eV) u
sed for the XPS measurements.