X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF ADSORPTION AND PHOTODISSOCIATION OF DIMETHYLALUMINUM HYDRIDE

Authors
OKAWA M TSURUTA H HANABUSA M
Citation
M. Okawa et al., X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF ADSORPTION AND PHOTODISSOCIATION OF DIMETHYLALUMINUM HYDRIDE, Applied surface science, 80, 1994, pp. 444-448
Citations number
13
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
80
Year of publication
1994
Pages
444 - 448
Database
ISI
SICI code
0169-4332(1994)80:<444:XPSOAA>2.0.ZU;2-T
Abstract
Adsorption of dimethylaluminum hydride on silicon oxide was detected b y the appearance of Al and C signals in X-ray photoelectron spectrosco py (XPS) spectra at room temperature and at 200-degrees-C. In addition , the effect of UV irradiation by a deuterium lamp was studied. A chan ge of the C/Al atomic ratio was found. A marked time dependence of the XPS signals was observed for adsorbates, which was attributed to deco mposition induced by the irradiation of the Al Kalpha line (1487 eV) u sed for the XPS measurements.