STRUCTURE OF OXYGEN, BORON AND NICKEL ION-IMPLANTED SILICA GLASSES

Authors
FUKUMI K CHAYAHARA A FUJII K HAYAKAWA J SATOU M
Citation
K. Fukumi et al., STRUCTURE OF OXYGEN, BORON AND NICKEL ION-IMPLANTED SILICA GLASSES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 91(1-4), 1994, pp. 413-417
Citations number
22
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
Journal title
Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms → ACNP
ISSN journal
0168583X
Volume
91
Issue
1-4
Year of publication
1994
Pages
413 - 417
Database
ISI
SICI code
0168-583X(1994)91:1-4<413:SOOBAN>2.0.ZU;2-C
Abstract
The structure of silica glass damaged by 1 MeV O+-, 1 MeV B+- and 4 Me V Ni2+-ion implantations has been investigated by X-ray diffraction, i nfrared reflection and ultraviolet absorption measurements. It is foun d that Si atoms form SiO4 tetrahedra in the damaged regions, as in the unimplanted glass. It is deduced that the average Si-O-Si bond angle decreases with ion implantations. The middle range ordering becomes re duced in the damaged regions. The structure of glasses damaged by the implantations of these ions resemble each other.