COLLOID FORMATION IN COPPER-IMPLANTED FUSED-SILICA AND SILICATE-GLASSES

Citation
P. Mazzoldi et al., COLLOID FORMATION IN COPPER-IMPLANTED FUSED-SILICA AND SILICATE-GLASSES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 91(1-4), 1994, pp. 505-509
Citations number
10
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
91
Issue
1-4
Year of publication
1994
Pages
505 - 509
Database
ISI
SICI code
0168-583X(1994)91:1-4<505:CFICFA>2.0.ZU;2-I
Abstract
Copper implantations (90 keV, 5 x 10(16) ionS/CM2) were made into fuse d silica, borosilicate glasses and soda-lime glass. The copper distrib ution has been found to vary according to glass type. The optical abso rption band characteristic of the implanted metal optical properties w as observed only for copper-implanted fused silica. The absorption for all the other samples was either not observable or was negligibly sma ll, however very small metallic particles are present also in the soda -lime glass. A subsequent nitrogen implantation (100 keV, 1.5 x 10(17) ions/cm2) completely eliminated the copper-colloid induced absorption in the copper-implanted fused silica, while it facilitated the format ion of copper-colloids.into the soda-lime glass.