A MECHANISTIC STUDY OF PHOTODECOMPOSITION OF ACENAPHTHYLENE ON A DRY SILICA SURFACE

Citation
Jt. Barbas et al., A MECHANISTIC STUDY OF PHOTODECOMPOSITION OF ACENAPHTHYLENE ON A DRY SILICA SURFACE, Journal of photochemistry and photobiology. A, Chemistry, 80(1-3), 1994, pp. 103-111
Citations number
34
Categorie Soggetti
Chemistry Physical
ISSN journal
10106030
Volume
80
Issue
1-3
Year of publication
1994
Pages
103 - 111
Database
ISI
SICI code
1010-6030(1994)80:1-3<103:AMSOPO>2.0.ZU;2-I
Abstract
The photochemistry of acenaphthylene (AC) has been studied on a dry si lica surface at very low coverages (less than 10% of a monolayer) unde r aerated conditions. Adsorption of AC onto silica surface from cycloh exane follows a Freundlich adsorption isotherm, demonstrating a range of weak interactions between AC and the surface active sites. Photolys is of AC at the solid-air interface led to the formation of photo-oxid ation products formed via the addition of singlet molecular oxygen to ground-state AC, and photodimers (cis and trans). The oxidation produc ts include 1,2-acenaphthenedione (1), 2-hydroxy-1-acenaphthenone (2), 1,8-naphthalenedicarboxaldehyde (3) and 1,8-naphthalic anhydride (4). The yield of dimers increases as the surface coverage is raised. Both the excited singlet state and the excited triplet state of AC are invo lved in the observed dimerization on the surface.