Sy. Dudnikov et Ma. Kartasheva, THE LUCH-2000 INDUCTIVELY-COUPLED PLASMA SOURCE FOR EMISSION SPECTRAL-ANALYSIS, Journal of optical technology, 61(5), 1994, pp. 408-411
The design, operating parameters and possibilities for the analytical
application of an inductively coupled plasma (ICP) source produced by
Eridan MVP, St. Petersburg, are investigated. The convenient layout of
the source makes it possible to use it in a complex with practically
any domestic and foreign emission spectrometers.