AN INVESTIGATION OF RANGE DISTRIBUTION PARAMETERS OF IMPLANTED F-19 IONS IN TANTALUM

Authors
TAN CY XIA YY LIU JT LIU XD
Citation
Cy. Tan et al., AN INVESTIGATION OF RANGE DISTRIBUTION PARAMETERS OF IMPLANTED F-19 IONS IN TANTALUM, Physics letters. A, 189(5), 1994, pp. 379-382
Citations number
20
Categorie Soggetti
Physics
Journal title
Physics letters. A → ACNP
ISSN journal
03759601
Volume
189
Issue
5
Year of publication
1994
Pages
379 - 382
Database
ISI
SICI code
0375-9601(1994)189:5<379:AIORDP>2.0.ZU;2-6
Abstract
Depth profiles of fluorine in F-19+ implanted tantalum have been accur ately measured using the F-19(p, alphagamma)O-16 resonance nuclear rea ction at E(R) = 872.1 keV. In order to extract the range distribution of implanted fluorine from the experimental excitation yield curve, a proper convolution calculated method is presented, from which the rang e distribution parameters, such as the average projected range R(p), t he projected range straggling DELTAR(p), and the skewness of the range distribution SK, were obtained.