PARTICIPATION OF EL2 IN THE DONOR ACTIVATION OF SILICON IMPLANTED INTO GAAS

Citation
P. Kengkan et al., PARTICIPATION OF EL2 IN THE DONOR ACTIVATION OF SILICON IMPLANTED INTO GAAS, Physical review. B, Condensed matter, 49(23), 1994, pp. 16309-16312
Citations number
27
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
49
Issue
23
Year of publication
1994
Pages
16309 - 16312
Database
ISI
SICI code
0163-1829(1994)49:23<16309:POEITD>2.0.ZU;2-C
Abstract
A simple model describing the electrical activation of moderate doses of silicon implanted into GaAs is presented. It involves only the defe cts Si(i)+ Si(Ga)+, Si(As)-, and EL2. Besides fitting available activa tion data (carrier concentration versus silicon concentration), it als o fits existing data describing the variation of carrier concentration with substrate EL2 concentration.