EFFECT OF A SULFUR LAYER ON OBLIQUELY DEPOSITED TITANIUM THIN-FILMS FOR A HYDROGEN ADSORPTION MECHANISM

Titanium thin films of about 1050 angstrom thickness were obliquely de posited at a pressure of 5 x 10(-5) torr by thermal evaporation on to a glass substrate at room temperature. The resistance of the films dep osited at different angles (theta = 0-degrees, 30-degrees, 45-degrees, 60-degrees, 75-degrees) and absorption of hydrogen increases with the angle of deposition. The change in resistance value is taken as a mea sure of the amount of hydrogen absorbed in the samples. It is observed that the amount of hydrogen absorbed increases with deposition angle which is due to an increase in the porosity of thin films. The sulphur layer (thickness 160 angstrom) deposited on the titanium thin film wa s found to produce a marked improvement in the properties of thin film for hydrogen storage and charging rate becomes faster in comparison t o titanium thin films.