A high frequency capacitance-voltage method is used to measure the ele
ctronic gap-state density in diamond-like carbon (DLC) films. The gap-
state density is derived from the analysis of high frequency capacitan
ce-voltage characteristics of DLC on crystalline silicon (c-Si) hetero
junctions. Near the Fermi level the gap-state density in the DLC thin
film is obtained of the order 10(16) cm-3 eV-1. Furthermore, the energ
y-band diagram of a DLC/c-Si heterojunction is evaluated, and the work
function of DLC is derived to be 3.6 eV