Pg. Baranov et al., CHROMIUM IN SILICON-CARBIDE - ELECTRON-PARAMAGNETIC-RESONANCE STUDIES, Semiconductor science and technology, 9(7), 1994, pp. 1340-1345
We report electron paramagnetic resopance measurements for various cha
rge.states of chromium substituting for silicon in single crystal epit
axial layers of 6H-SiC. The EPR spectra of Cr3+(3d3) with S = 3/2 in t
he A--state on three lattice sites (a hexagonal and two quasi-cubic on
es) were observed. The hyperfine structure of the isotope Cr-53 and th
e superhyperfine structure of the ligand Si-29 and C-13 were measured.
For the neutral A0-state of Cr4+(3d2), a spin triplet EPR spectrum wa
s found with the fine structure parameter D = 3.35 GHz and g(parallel-
to) = 2.0, g(perpendicular-to) = 2.01. Additional anisotropic EPR line
s were detected and described by the effective spin 1/2 and g-factors
1.77 and 3.7 when the magnetic field was applied parallel and perpendi
cular to the c-axis, respectively. In p-type epitaxial layers produced
by boron diffusion into chromium-doped samples, new EPR spectra were
observed with parameters close to the ODMR data for deep boron centres
.