METALLIZATION STRESS IN WEAKLY GUIDING INP INGAASP WAVE-GUIDES/

Citation
Mg. Daly et al., METALLIZATION STRESS IN WEAKLY GUIDING INP INGAASP WAVE-GUIDES/, Semiconductor science and technology, 9(7), 1994, pp. 1387-1390
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
9
Issue
7
Year of publication
1994
Pages
1387 - 1390
Database
ISI
SICI code
0268-1242(1994)9:7<1387:MSIWGI>2.0.ZU;2-Q
Abstract
Although contact metallization causes stress in the underlying materia l, the magnitude of the resulting change in refractive index is often not appreciated. We investigate here the distribution of the change in refractive index due to stress caused by Ti/Pt/Au contact layers in w eakly guiding InGaAsP waveguides operating near 1.3 mum. Polarization- resolved photoluminescence and beam propagation calculations, combined with a simple stress model, are applicable to general processing-indu ced stress in InP-based waveguides and to waveguide design.