GIANT MAGNETORESISTANCE AND ANTIFERROMAGNETICALLY COUPLED CO FRACTIONIN CO CU MULTILAYERS WITH VARYING NUMBER OF PERIODS/

Citation
Ham. Vandenberg et G. Rupp, GIANT MAGNETORESISTANCE AND ANTIFERROMAGNETICALLY COUPLED CO FRACTIONIN CO CU MULTILAYERS WITH VARYING NUMBER OF PERIODS/, IEEE transactions on magnetics, 30(2), 1994, pp. 809-811
Citations number
3
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189464
Volume
30
Issue
2
Year of publication
1994
Part
2
Pages
809 - 811
Database
ISI
SICI code
0018-9464(1994)30:2<809:GMAACC>2.0.ZU;2-#
Abstract
The Giant Magnetoresistive signal of Co/Cu multilayers as a function o f the number N(Co) of Co layers is experimentally investigated for Cu thicknesses of 1 nm, i.e. in the 1 st antiferromagnetic maximum, and f or Co layer thickness of 1 nm. The stacks were deposited by DC magnetr on sputtering on an Fe buffer. The fraction F(AF) of the film that cou ples antiferromagnetically is derived from the hysteresis curves. A co rrection of F(AF) is required for the buffer and one Co layer. The F(A F) of stack periods close to the buffer is about 1, while F(AF) reduce s at large stack thicknesses. The GMR of stacks with small thicknesses is limited by the diffuse scattering at the outer surfaces. The GMR o f thicker stacks depends on F(AF) and the resistivity. Furthermore, th e meaning of F(AF) is discussed. By optimizing N(Co), we achieved DELT Arho/rho's as high as 72% at room temperature.