Jd. Ouwens et al., INTERPRETATION OF THE SILICON-HYDROGEN STRETCHING DOUBLET IN A-SIH HYDROGENATED AMORPHOUS-SILICON, Applied physics letters, 65(2), 1994, pp. 204-206
We studied the correlation between the infrared integrated absorption
strengths of the wagging, bending and stretching modes for four hydrog
enated amorphous silicon (a-Si:H) series, deposited by rf glow dischar
ge. The strength of these modes was varied by changing the deposition
temperature while keeping other parameters fixed. For the first time i
t is shown that a straightforward correlation exists between these thr
ee modes. It is argued that the 2100-cm-1 mode is due to SiH2 bonds an
d that there is no contribution of SiH species on the inner surface of
voids. The vibrational spectrum of a-Si:H can be well described by co
nsidering the vibrating dipole as a harmonic oscillator with an effect
ive charge e=0.44 electrons.