DIFFRACTION FROM OPTICALLY WRITTEN PERSISTENT PLASMA GRATINGS IN DOPED COMPOUND SEMICONDUCTORS

Citation
Ra. Linke et al., DIFFRACTION FROM OPTICALLY WRITTEN PERSISTENT PLASMA GRATINGS IN DOPED COMPOUND SEMICONDUCTORS, Applied physics letters, 65(1), 1994, pp. 16-18
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
65
Issue
1
Year of publication
1994
Pages
16 - 18
Database
ISI
SICI code
0003-6951(1994)65:1<16:DFOWPP>2.0.ZU;2-Z
Abstract
We propose and demonstrate a new type of optical nonlinearity based on the properties of the DX center in doped compound semiconductors. We report measurements on samples of AlGaAs:Si which were exposed to inte rfering laser beams and find diffraction from a large, persistent refr active index change associated with the well-known persistent photocon ductivity effect in this material. The new effect is shown to exhibit a refractive index change 30 times larger than that of conventional ph otorefractive materials. We explain the origin of the refractive index change in terms of the plasma effect and show that its expected magni tude is consistent with our observations.