PRESSURE AND TEMPERATURE-DEPENDENCE OF THE GAS-PHASE REACTION BETWEENMETHYL AND HYDROXYL RADICALS

Citation
K. Fagerstrom et al., PRESSURE AND TEMPERATURE-DEPENDENCE OF THE GAS-PHASE REACTION BETWEENMETHYL AND HYDROXYL RADICALS, Chemical physics letters, 224(1-2), 1994, pp. 43-50
Citations number
32
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
224
Issue
1-2
Year of publication
1994
Pages
43 - 50
Database
ISI
SICI code
0009-2614(1994)224:1-2<43:PATOTG>2.0.ZU;2-N
Abstract
The kinetics of the reaction CH3+OH(+M)-->CH3OH(+M) was studied in the temperature range 283-373 K and in the pressure range 85-1000 mbar SF 6 by pulse radiolysis combined with UV absorption spectroscopy. The me thyl and hydroxyl radical decays were followed by monitoring the trans ient UV absorption signals at 216.4 nm and 309.0 nm respectively. The reaction was studied in the fall-off region and by Troe's analysis the following high- and low-pressure limiting rate constants were obtaine d: k(rec,infinity) = (8.7 +/- 0.7) x 10(10)(T/300)0.1 M-1 s-1 and k(re c,0/[SF6] = (9.0 +/- 2.4) x 10(14)(T/300)-3.8 M-2 s-1. The low-pressur e limiting rate constant for the OH radical self-reaction was also der ived: k(OH+OH,0)/[SF6]=(4.0 +/- 0.7) x 10(11)(T/300)-1.4 M-2 s-1 using the value of k(OH+OH,infinity = 1.8 x 10(10)(T/300)-0.37 M-1 s-1 for the high-pressure limit.